AR coatings 
HR coatings 
Stresses 
Mid-infrared dispersive mirrors 
OTF StuDio Development history (updates and bug fixes)
24.35
1. Stack options (analysis, synthesis) are implemented. Stack is an assembly of substrates (media) and coatings. Each substrate may be coated or uncoated by multilayer(s). Each substrate can be parallel or wedged.
- Calculation of spectral characteristics of stacks
- Calculation of colors
- Calculation of integral values
- Monte-Carlo simulations
- Copy numbers and stack reports
- Synthesis of stacks
2. Import of multiple measurements recorded in the course of the coating deposition, for example, multi-scan BBM data.
3. Further enhancement of import options: ThinProcess® (Zeiss) import is implemented.
4. COM interfaces enhancement:
- Multi-scan reverse engineering Python example is added
- Clear operation for Color target and Integral target added
- Computational functions called through COM update Design Builder panel settings
5. Catalog news:
- Catalog is extended with Schott Glass data
- Interface was improved: numbers columns removed, capabilities to sort and filter through small buttons in the column header are added.
6. The "New Project" option is now more friendly: it opens now several panels frequently used in the work flow.
7. Bugs fixing:
- If Gradual Evolution started from the empty design, in some cases it included a material, not selected in the corresponding setting. Fixed.
- If Specifications were loaded, a warning about wrong range was issued. Warning removed.
- In Import from Excel, measurement were not appended to the opened measurement table on the repeated clicks on Import buttons. Fixed.
24.32
1. Further Enhancement of the Color Block:
- Lab color diagram is implemented (in Analysis/Synthesis and in Reverse Engineering).
- Color evaluation in Reverse Engineering added. Now it is possible to calculate colors of the current model and compare them with the colors of measurements and colors related to color targets.
- Display of colors in two different color spaces implemented. For example, it is possible to see color coordinates in numerical form in chromaticities and Lab spaces simultaneously.
- Complimentary target color characteristics are displayed better: "1 - " prefix added to indicate computed values.
- Saving the selected tabs in all color-related panels between OTF Studio sessions: When you save the project and close the program, the configuration of opened tabs is also saved. Upon reopening the same project, the tabs will be restored to their state at the time of closing.
2. Support of Multi-scan measurements in Reverse Engineering is implemented. Now it is possible to load measurements after each layer, apply Reverse Engineering models, and perform post-production characterization based on measurements recorded in-situ after deposition of each layer.
3. Electric Field display is improved: scaling of axes, better display of layer boundaries.
4. New Import feature: import from Optoplex files added.
5. The Reverse Engineering Model Builder is now more convenient: the selection of active layers for Random or Quasi Random errors is preserved throughout the entire reverse engineering process. This enhancement is particularly important for solving complex reverse engineering problems that require multiple steps.
6. Enhancement of COM interfaces: support of Multi-scan measurement implemented. New COM example demonstrating Multi-Scan measurement processg (C#) added to the installaton package.
7. Bug fixes:
- An inconsistency in "Reference" comb-box in the Defferences panel of Color panel fixed.
- If Compare mode is active, checkboxes appeared on a new database panel, even if this database is not related to the items of the comparison. Fixed.
- Check boxes "Show Loaded Materials" and "Include index offset" placed on the top of the panel to avoid overlapping.
24.29
1. Further Enhancement of the Color Block: Calculations of color differences between Target and Design, Color Target and Design, and Target and Color Target.
2. Enhancement of the Color Block: display of target color characteristics. It works if the conventional target has compatible characteristics in the color-related spectral range.
3. Import from Semilab *.smdx files (ellipsometry) data implemented.
4. Configuration: Monitoring wavelength ranges added.
5. Added: Preventing sleep state of laptops when computations are running.
24.28
1. Enhancement of Color Block: specifications in colors are implemented. Color distances according to CIEDE 2000, CIE 94, CIE 76, CMC 1:1, CMC 2:1.
2. Enhancement of Color Block: Monte Carlo simulations of color coordinates are implemented.
3. Monte Carlo simulations of values are implemented.
4. Enhancement of Multi-Start algorithm: Jumps in Multi-Start Design Vicinity have 3 possible settings: Not Allowed (= No Jumps), Normal, Aggressive (fast jump to better design).
5. Reverse Layers added to the right-click menu of the Design Editor.
6. New Hotkey: Ctrl+Enter key combination works as "Commit" in all editors.
7. Improvement of DSG file import: correct processing of files with coinciding names of layer materials. To resolve sich collisions additional materials are renamed.
24.27
1. Monte-Carlo simulation of Electric Field is implemented.
2. New COM interfaces: Specifications and Specification Quality value are accessible with COM interfaces.
3. Compare Re(n) plots bug fixed: wrong display if "Show Loaded" is cheched/unchecked.
4. Preview of Target and Specifications shows Expressions.
5. If a target uses floating constants, the conversion to specifications is possible.
6. Bug with layer delete in the Design Editor fixed.
7. Inconsistency in Project - Open - Computer and Project - Save As - Computer commads: a wrong folder was selected; fixed.
24.26
1. Design Editor now keeps layer thickness even when the related material abbreviation is not assigned: to keep physical thicknesses the Physical thicknesses checkbox should be checked; to keep optical thicknesses, Physical thicknesses checkbox should be unchecked.
2. Specifications now work with Expressions.
3. Sliders for monitoring wavelengths added to Monitoring Runsheet Editor (OM mode).
4. In Sensitivity analysis, the ability to change sort order of any column was added: sorting by sensitivity value, sorting by thickness, etc.
5. Save Design (in Results ribbon as well as in the In-Memory Editor) option enhanced: it shows a drop-down list of already available designs. Therefore it is easy to replace an already existing design by the new one.
6. Right-click drop-down list in the Environment panel enhanced: Save to Database (if Design is selected) item is added.
7. Extended expressions enhanced: non-local optimization methods (Needle Optimization and Gradual Evolution) can be used.
8. Variator shows now correct Reference Wavelength configured in the General options dialog.
9. Variator control wavelength remained at a modified position after Revert operation. Fixed.
10. If materials colors are edited in the General Options dialog and color gallery is drop-down, a click outside the color editor leads to an exception "control has no parent window". Fixed.
11. Partial Discrepancies panel remains in linear units even if dB or OD selected as Intensities: the differences should be always represented in a linear scale.
12. Default lower boundary in Substrate Characterization Model Builder (explicit formulas algorithm n,k) was replaced by 1.2 instead of 0.8. It helps to exclude degenerate solutionsю
24.25
1. Computations with new types of layer materials with optical constants dependent on film thickness, mixtures, inhomogeneous materials enhanced: materials should with with all types of targets, spectral and integral characteristics. Complex layer profiles can be specified.
2. Apply tab added to the Design Editor in the case of In-Memory Design Editor. [M] modified state appears in this case in Design section of Environment panel.
3. Gradual Evolution terminates also if merit function is very close to zero to avoid growth of design thickness (especially if targets with ranges or color targets are used).
4. Advanced Expressions feature is added. It is possible now to introduce additional target spectral characteristics shifted/scaled in AOI or in the wavelength.
5. Import from LMR (Bühler Leybold Runsheet) files added in AS, RE, and OM modes.
6. Empty names in Chips Editor in OM raised an exception. Fixed.
7. Sometimes Expressions were not listed in the Target Editor and had to be specified manually. Fixed.
8. Spectral Line Width bug fixed: if only one wavelength point was specified, calculations were not correct. More complicated line width objects (2 and more wavelength points) were processed normally. Now all cases are considered correctly.
9. Specifications of floating constants in different target pages improved.
10. Compare design feature improved.
11. Sometimes, target names in legend in plots were incorrect. Now, the target names updates, when a new target is loaded.
12. Copy Numbers enhancement: prevented situation when output range is outside the plotting range (it created empty values in the output).
13. Averaged or Integral characteristic was blank by default. Now it is always a reasonable default: RA or TS.
14. List index out of bounds error appeared if the plots in the Evaluation window are configured with column Editor or Grid Generator, and the number of plots is increased from these editors. Fixed.
15. If Compare tab is active, selection check boxes remained in some databases. Fixed.
16. The title of X-axis of the Evaluation plot was not updated on Wavelength units change. Fixed.
17. Design Editor reflects changes of material abbreviations (zero physical thicknesses). In the next version, physical thicknesses will be independent on materials changes for the case if "keep physical thicknesses" setting is active.
24.22
1. U- and g-values evaluator is implemented: single, double, and triple glazing can be configured and evaluated. The values can be chosen in the Values panel and can be changed interactively if Variator is in use. Computations are performed according to DIN EN410 standard.
2. Arbitrary model algorithm of substrate characterization is further enhanced.
3. Expressions editor is enhanced.
4. Further enhancement of Monte-Carlo simulations: faster plotting for the number of tests exceeding 200.
5. Monte-Carlo simulations with loaded specifications raised an exception. Fixed.
6. Exponential model for Im(n) in Characterization is more smart now: the algorithm avoids degenerate solutions.
24.20
1. Specifications and ability to use spectral specifications is implemented. You can create a specs-target and use it to verify, whether your spectral characteristics are inside of allowed specifications. Quality parameters is added.
2. Jumps settings is implemented in Multi-Start algorithm (Design Vicinity mode). It controls, whether a better design will replace the initial one in the course of Multi-Start optimization.
3. Multi-Start was not possible if no design loaded to memory (Include Materials selection was empty). Fixed.
4. COM: added MaterialFromAbbreviation read-only property to MemoryMaterials collection. It allows to obtain a layer material using abbreviation.
5. Expressions added to the Design Report.
24.19
1. A very powerful set of Expressions features developed: now it is possible to optimize expressions such as Ts/Tp, Rp/Rs, Rs-Rp, Ts-Tp, etc. It is possible to arrange complex building blocks from the optimized spectral characteristics. Expressions include arithmetical operations connecting spectral characteristics, constants, and already known expressions.
2. Expressions can be used also integral targets and in value evaluations. It is possible to apply instant analysis to expression along with spectral characteristics, colors, and integral values. Expressions enhance significantly analysis and synthesis options.
3. Additional plot for Expressions is implemented: curves in the Expression Evaluation plot are also updated if a target with expression is loaded.
4. Bugs fixed in Monte-Carlo simulations.
5. Too large font sizes of all plots, if the project is transferred from computer with high DPI to another computer with lower DPI
6. Selection (red color curve) of the layer in Monitoring Spreadsheet was sometimes not synchronized with the position in the spreadsheet.
7. Optical losses: small fonts of the warning at high DPI screens. Font sizes increased.
24.17
1. Logarithmic and Diabatic scales in evaluation plots implemented.
2. Plotting is significantly improved. Contrasts are improved. Scaling in multi-monitoring environment is enhanced. More convenient graphics.
3. Swing computations in optical monitoring mode improved: with large correction factors, swing sometimes was replaced with NAN symbol (Not-A-Number).
4. Fixed rare exception in optical monitoring mode. It appeared only when ESC key was pressed twice in editing mode of some Runsheet cell.
5. Improvement in on-the-fly analysis: modified design status maintained correctly, the state of the Revert button is defined by the internal state of the variator.
6. The width of Design/Model Builder at displays with high resolution was not enough.
7. Values panel: sometimes color values were calculated with incorrect characteristic (TS instead of RS).
8. Fixed set of bugs in optical monitoring mode: in some configurations the design was not possible to load, sometimes vacuum materials were not taken into account correctly.
24.15
1. Values panel with versatile configuration and representation of multiple values (integrated and averaged spectral characteristics, integrated and averaged color coordinates) implemented. Integral values in Values panel now take into account unit settings.
2. A dialog to configure weight factors of different targets added. It is accessible from Environment panel either through the special button on the top, or right-click menu.
3. Re(n) and Im(n) can be displayed in the Substrate and Layer Material tables. It can be controlled individually (top left corner) or centralized in configuration settings panel. These columns allow easy filtering of the data.
4. Seven new substrates added to the Catalog.
5. Witness Chip configuration dialog has now more convenient editing features (Enter key, Column Editor F6).
6. The visibility states of the Design Editor columns is now preserved in the layout configuration.
7. Offset was lost, if a material was saved together with reverse-engineered design. Fixed.
8. Plot bug in the Materials (Style, Color) column in the configuration window, visible during scrolling. Fixed.
9. Substrate characterization is now always possible, even if no substrate loaded to Environment.
10. After closing and opening Design Builder displayed an empty panel. Fixed.
11. Design [M] flag remained all the time, even after a design from the database is loaded (Environment panel). Fixed.
12. If vacuum materials are used in optical monitoring Runsheet, design thicknesses changed a bit after saving the runsheet to the database. Fixed. The problem was related to using optical thicknesses as intermediate values. Now OM mode uses physical thicknesses in all cases.
13. Design Editor in OM mode sometimes didn't allow to edit the design, complaining that materials are not loaded. Fixed.
24.12
1. Full support of Apple M1 - M3 ARM-based processors.
2. Integral target values can be also computed with trapezoid numerical formula. Trapezoid integration method added to Integral Target settings.
3. In Plots settings: Added "Adjust Range on Integral Target Load Operation" option.
4. Added Report options in order to configure the output spectral grid.
5. Added "Target Grid" or "Measurement Grid" to "Copy Numbers" right-click menu. It allows to extract values for target/measurement wavelength grid points.
6. Measurement preprocessing bug: when the number of points in the measurement was reduced, ellipsometric angle Delta become 0.0. Fixed.
7. COM examples (C#, Python, Matlab) extended and updated.
8. COM update: Wait function added to IInfo interface to allow waiting for computation completion.
9. Fixed Access Violation error if environment mode switched from analysis/synthesis to another, and Multi-Coating mode was Active.
10. Improvement in Combine measurements: the operation can now work with any types and combinations of measurement files.
11. Improved of design cross section panel in the case of designs with extremely large number of layers (>1000).
24.10
1. Extension of the Python COM example, more calls, properties, and functions demonstrated.
2. Enhancement of the Python COM example: the example demonstrates now also reverse engineering operations.
3. In reverse engineering and characterization: Preprocessing of the measurements enhanced: ability to reduce the number of measurement points added.
4. Enhancement in reverse engineering and characterization: Preprocess command added to the Measurement Editor (with the ability to Revert Back preprocessing action).
5. Added Delete Row, Insert Above, Insert Below, Select Row commands to the right-click drop-down menu of all Editors (Measurement, Target, Design, etc.)
6. In reverse engineering and characterization: import from VON ARDENNE file format implemented.
7. ARM support provided for both 32 and 64 versions. It is possible to use OTF Studio at M1-M3 Apple ARM processors (Windows for ARM under Parallels 19).
8. For complicated multi-page targets/measurements the legend in the Evaluation/Fitting plots was not correct. Fixed.
9. Using "Del" and some other hotkeys in the Environment window caused Exceptions in some cases. Fixed.
10. Extinction coefficients formula coefficients added to the Report.
11. Rename items and copy items now uses case-sensitive check, i.e., it is possible to change only the capitalization of any name.
12. Avoiding x-axis settings reset after updating OTF Studio configuration.
13. Plots are now updated after change of "Apply Source and Detector to R/T values" option in the OTF Studio settings panel.
14. Maximum number of points in one page of Measurements/Targets increased up to 32768.
15. Integral targets and Integral Values in the Design report are now dependent on the setting "Apply Source and Detector to R/T Values"
16. COM function getModelThicknesses returned thicknesses in µm, ignoring current units settings. Fixed.
24.09
1. Multi-Start Generator: added an opportunity to select a material for the first layer (the layer closest to the substrate). It can be selected from (i) the list of loaded materials, (ii) specified as the most contrast with respect to the substrate, and (iii) specified as any available (random selection).
2. Formula editor enhancement: it is now possible to specify the central wavelength for selected groups of layers, different from the reference wavelength of the entire design.
3. Enhancement of the Variator (Analysis on the fly): Ctrl+Alt+C hotkey and "Revert Value" (right click drop-down menu) allows to revert back any single thickness changed in the Variator
4. Enhancement of the Variator (Analysis on the fly): Surroundings Group added to the Variator: it allows to change substrate and incident medium refractive index offsets.
5. Enhancement of the Variator (Analysis on the fly): Control Wavelength added to the Correction Factors Group.
6. Enhancement of the Variator (Analysis on the fly) in the reverse engineering: it is possible to present layer thicknesses in quarter-waves (QW mode).
7. Monte-Carlo simulations enhanced: it is now possible to specify Re(n) standard deviation in %.
8. Import from Essential Macleod improved: imported Design was not saved to the Design database. Fixed.
9. Import from TFCalc improved: Access Violation problem at some files. Fixed.
10. Weight factors of target specified DSG files were wrong imported. Fixed.
11. Inconsistencies in naming and order of Im(n) Exponential models in charcaterization and reverse engineering fixed.
12. Control wavelength changes in the Variator also updates the wavelength at which refractive indices are evaluated for other Variator parts (Substrate, Incidence medium).
13. Monte-Carlo settings of x, y axes are consistent for both pages (Show Statistics = On and Off) and also are correctly saved in the Project configuration.
14. New COM interfaces implemented: added clear, clearAll, copy, rename functions to the databases. Added addPage, setDesign methods to the In-Memory interfaces. Added clear and getRenFormula, getImnFormula methods to the reverse engineering model interface.
15. Improvement in Multi-Start Generator: prevented user-interface flooding, if the design problem is simple and too many solutions are generated each second.
24.08
1. Adjust Plots on Target/Measurement Load option (Settings ribbon - General options - Plots - Check box "Adjust Plots on Target/Measurement Load").
2. Apply spectra (light source, detector) to R/T values (Settings ribbon - General options - Plots - Check box "Apply source and Detector to R/T values").
3. Added thickness values to the hover panel in the Design Cross-Section panel.
4. Logic of plotting changed: not the theoretical curve is adjusted to local x-limits and replotted on their change with 300ms delay (to avoid too frequent updates).
5. Model report displayed a wrong substrate name and data in some cases. Fixed.
6. When a new target is loaded and the number of plots is therefore changed, "Qty" value (right panel of the evaluation) remains the same. Fixed.
24.07
1. COM Automation interfaces are now available in OTF Studio. C# example is implemented. COM interfaces allows you to use OTF Studio algorithms in your own applications.
2. GD/GDD/Phase Generator Tool added to the Target Editor.
3. Target Generator Tool added to the Target Editor.
24.05
1. Export to OpTaliX improved.
2. Target/Measurement editors improved: when another characteristic is entered, the values of the changed column are preserved instead of using default values.
3. Size of the main panel after restart was a bit different each time. Fixed.
4. A bug on Save Layer in characterization fixed: if offset model was used, the offset was added.
24.03
1. Improved import from RefractiveIndex.Info: for glasses, the most informative part of the title goes now into the substrate/material name, while the rest goes in the comment.
2. Changing abbreviations in the Environment panel reflects in the selected materials in the Design Builder.
3. Changing abbreviations in General Options dialog had no effect. Bug fixed.
4. One-offset model in characterization was not working properly. Fixed.
24.02
1. Materials group added to General Options panel. It is possible to configure materials representation (colors, style) in all modes.
2. Icons and material colors, styles added to the Environment panel.
24.01
1. Multi-Coating configuration support allows you to design complex coatings for laser applications: complementary mirror pairs, double-angle for dispersive mirrors. Flexible settings.
2. Added support of processors without AVX2.
3. Help can be opened with Help command at the Help Ribbon.
23.89
1. Fixed a bug in the measurement configuration dialog.
2. ODX import had a problem when imported into a project with already configured environment, especially of materials were different from the loaded ones. Fixed.
3. Loaded materials in the Environment panel become blank when changing them. Fixed.
23.87
1. Prevented the situation when a design has 2 layers of the same material not combined together.
2. Fixed bug in the Design Report: wrong QWOT values.
3. Improved Gradual Evolution algorithm with settings, where the new layers are inserted.
4. Improved Needle optimization: inserted a layer inside a fixed layer excluded. Fixed.
5. Added a possibility to exclude layers from the optical monitoring runsheet .
6. Advanced Needle optimization: materials can be active and inactive.
23.86
1. Tooltips feature with markers in the Evaluation plots is implemented. Tooltips show all values presented at the plot with markers.
23.85
1. Line Width was not available in the Environment Panel. Fixed.
2. Reports extended with more detailed information on loaded objects. Added Save as Text comment to the drop-down menus of the Report tabs at the Results ribbon.
3. Added Floating Constants to the computational part and to the Target Editor. Characteristics Selector dialog completely redesigned.
4. In Color Evaluation, color coordinate system selection was not updated, if preferred color system in Settings ribbon is changed. Fixed.
5. Save object to the database with an existing name (overwrite mode) worked in a wrong way: a different object was overwritten. Fixed.
6. Design Builder has now a footer with a total coating thicknesses. Hint window shows also total thicknesses for each material.
7. Design Editor now doesn't allow to change the material abbreviation to not-loaded materials if the Design Editor is opened in the In-Memory editor.
23.84
1. On-the-fly analysis (Variator) added to Synthesis ribbon and to the Design Builder. On-the-fly analysis can be applied to spectral characteristics, colors, and electric field.
23.83
1. Copy Numbers option operates also in the electric field panel.
2. Tooltips operate now in electric field panel.
3. Bug in Integral Target optimization fixed.
4. Import of Agilent files showed one less trace than required. Fixed.
5. Monte-Carlo simulations: a bug of target representation fixed.
6. Scale settings inconsistencies in Evaluation and Monte-Carlo plots fixed.
23.82
1. Bug in Optimization with groups fixed.
2. Corrected the format of angles in the legend and in the "Copy Numbers" option to increase the number of digits.
3. Electric field analysis options is developed (View ribbon). It is possible to change all settings using right panel and to adjust the ranges and the types of output. It is also possible to see E-field intensity and E-field phase, s- and p- polarization.
4. Export to Report of large values (GDD, for example) sometimes created overlapped numbers in the output. Fixed.
5. Ability to configure the tabular representation in Report outputs (Model menu at the Results ribbon). It is also possible to specify Measurement wavelength grid as the grid for the dispersion output.
23.79
1. Compare designs feature (View Ribbon) added. Now, it is possible to compare spectral characteristics of the designs from the design table as well as the designs from History and Collection panels.
2. Horizontal scroll bar added to Target/Measurement editors.
3. A computational degradation of performance in cases when some materials were using Spline interpolation fixed.
4. Better visual feedback in the Layer Model Builder: disabled parts of the model are now shown in gray color.
5. Corrected Layer Model Builder problem: when no models are active, in some cases the discrepancy is increased after Fit action.
6. It was possible to select 1 or even 0 materials from multi-start optimization. Fixed. At least 2 materials should be selected for multi-start correct operations.
7. In some cases merit function (MF) was displayed as "n/a" in the main status bar, even if some valid targets were loaded. Fixed.
8. In some cases, after gradual evolution it was not possible to select constraints for some materials, especially when they were excluded/included to Active list. Fixed.
9. Added check for at least 2 materials before gradual evolution starts.
10. If design is edited without layer materials in the memory, it creates Access Violation errors. Fixed.
11. Copy Numbers added to OM plots.
12. MOCCA export adjusted to conform better MOCCA specifications (rate, fixed layers attributes - "non-optical-control").
13. The caption of "New Item Name" form is also updates in accordance of database type selected in this dialog.
23.77
1. Fixed a bug in the Substrate characterization. This bug significantly decreased the efficiency of non-parametric model.
2. In rare cases, Access violation problems were possible, if Monte Carlo computations were running, and the Monte Carlo panel is closed. Fixed.
3. Import of Agilent measurements improved: now it is possible to import traces one by one without closing Import dialog.
4. Added import of designs from Essential Macleod files.
23.76
1. Tooltips feature added to the Evaluation plots.
2. Added SVG and EMF export format to the list of "Save Chart" command (Results ribbon).
3. Copy Numbers feature added: it is available at the right-click drop-down menu of Evaluation and Fitting plots.
4. Several display bugs in OM mode fixed: non scaled data in the plots were used.
5. Tooltips format (the number of digits) is dependent now on the selected units, argument values are also shown.
23.75
1. Added Color Rendering Index to Color values.
2. Fixed scaling problem in Integral Target part of the merit function.
3. Sensitivity analysis feature added.
4. Problem with positions of secondary dialogs at multimonitor systems fixed.
23.72
1. Optical Monitoring runsheet created.
2. Export to OpTaliX, FRED, and CODE V added.
3. Legend visibility is now save correctly in the project layout.
4. It is possible to select the whole response column data in the Design Runsheet report.
5. Response values are now copied to clipboard without control characters.
6. Color diagram and color values are completed.
7. Now it is required to save a modified design before switching to OM mode. It removes potential inconsistencies.
23.71
1. In some cases Design Cleaner finished with the same material layers being next to each other. Now such layers are combined together.
23.68
1. ODX file support added: import and export.
2. Import of TFCalc files added.
3. Import and export of DSG files (SPEKTRUM software from LZH).
4. Integral Targets load problem when a spectrum with a special character is used (", &, etc).
5. Reports are now refreshed automatically (with a delay, to save CPU resources).
6. Report becomes empty if it is docked/undocked to another location with mouse. Fixed.
7. OM - Optical Monitoring - Witness Chip config dialog and OM mode added.
8. Specs targets were not displayed correctly: only low limit was shown.
9. Potential infinite loop on any attempt to Terminate a processing in Deep Search mode. Fixed.
10. Better current status updates (Evaluation, Design Cross section) during synthesis processing. It is now performed at least each 5 seconds.
11. Problems with "Fixed" status of layer thickness found and improved.
12. Refractiveindex.info database updated to the newest state of October 2023.
13. Help updated (introduction, examples). The number of Examples is extended up to 43.
