OTF STUDIO:  ALL  IN  A  NEW  LIGHT

OTF Studio Workshop Tegernsee

Workshop schedule

OTF Studio workshop will be held at the hotel Terrassenhof in Bad Wiessee, Tegernsee, Germany

Save the date:

22.05.2024 - 24.05.2024 (registration is closed)


Save the date:

28.10.2024 - 30.10.2024

Next OTF Studio workshop will be held in Lüneburg, Germany. Pre-registration is now opened via e-mail: i.langbein@gmx.de or support@otfstudio.com.


New features, updates, and bug fix are here.

The most recent: Values panel with integral and averaged values.

Support of Apple M1-M3 ARM based processors.


 OTF StuDio Development history (updates and bug fixes)

24.15

1. Values panel with versatile configuration and representation of multiple values (integrated and averaged spectral characteristics, integrated and averaged color coordinates) implemented. Intergral values in Values panel now take into account unit settings.

2. A dialog to configure weight factors of different targets added. It is accessible from Environment panel either through the special button on the top, or right-click menu.

3.  Re(n) and Im(n) can be displayed in the Substrate and Layer Material tables. It can be controlled individually (top left corner) or centralized in configuration settings panel. These columns allow easy filtering of the data.

4. Seven new substrates added to the Catalog.

5. Withness Chip configuration dialog has now more convenient editing features (Enter key, Column Editor F6).

6. The visibility states of the Design Editor columns is now preserved in the layout configuration.

7. Offset was lost, if a material was saved together with reverse-engineered design. Fixed.

8. Plot bug in the Materials (Style, Color) column in the configuration window, visible during scrolling. Fixed.

9. Substrate characterization is now always possible, even if no substrate loaded to Environment.

10. After closing and opening Design Builder displayed an empty panel. Fixed.

11. Design [M] flag remained all the time, even after a design from the database is loaded (Environment panel). Fixed.

12. If vacuum materials are used in optical monitoring Runsheet, design thicknesses changed a bit after saving the runsheet to the database. Fixed. The problem was related to using optical thicknesses as intermediate values. Now OM mode uses physical thicknesses in all cases.

13. Design Editor in OM mode sometimes didn't allow to edit the design, complaining that materials are not loaded. Fixed.


24.12

1. Full support of Apple M1 - M3 ARM-based processors.

2. Integral target values can be also computed with trapezoid numerical formula. Trapezoid integration method added to Integral Target settings.

3. In Plots settings: Added "Adjust Range on Integral Target Load Operation" option.

4. Added Report options in order to configure the output spectral grid.

5. Added "Target Grid" or "Measurement Grid" to "Copy Numbers" right-click menu. It allows to extract values for target/measurement wavelength grid points.

6. Measurement preprocessing bug: when the number of points in the measurement was reduced, ellipsometric angle Delta become 0.0. Fixed.

7. COM examples (C#, Python, Matlab) extended and updated.

8. COM update: Wait function added to IInfo interface to allow waiting for computation completion.

9. Fixed Access Violation error if environment mode switched from analysis/synthesis to another, and Multi-Coating mode was Active.

10. Impovement in Combine measurements: the operation can now work with any types and combinations of measurement files.

11. Improved of desin cross section panel in the case of designs with extremely large number of layers (>1000). 


24.10

1. Extension of the Python COM example, more calls, properties, and functions demonstrated.

2. Enhancement of the Python COM example: the example demonstrates now also reverse engineering operations.

2. In reverse engineering and characterization: Preprocessing of the measurements enhanced: ability to reduce the number of measurement points added.

3. Enhancement in reverse engineering and characterization: Preprocess command added to the Measurement Editor (with the ability to Revert Back preprocessing action).

3. Added Delete Row, Insert Above, Insert Below, Select Row commands to the right-click drop-down menu of all Editors (Measurement, Target, Design, etc.)

4. In reverse engineering and characterization: import from VON ARDENNE file format implemented.

5. ARM support provided for both 32 and 64 versions. It is possible to use OTF Studio at M1-M3 Apple ARM processors (Windows for ARM under Parallels 19).

6. For complicated multi-page targets/measurements the legend in the Evaluation/Fitting plots was not correct. Fixed.

7. Using "Del" and some other hotkeys in the Environment window caused Exceptions in some cases. Fixed.

8. Extinction coefficients formula coefficients added to the Report.

9. Rename items and copy items now uses case-sensitive check, i.e., it is possible to change only the capitalization of any name.

10. Avoiding x-axis settings reset after updating OTF Studio configuration.

11. Plots are now updated after change of "Apply Source and Detector to R/T values" option in the OTF Studio settings panel.

12. Maximum number of points in one page of Measurements/Targets increased up to 32768.

13. Integral targets and Integral Values in the Design report are now dependent on the setting "Apply Source and Detector to R/T Values"

14. COM function getModelThicknesses returned thicknesses in µm, ignoring current units settings. Fixed.


 24.09

1. Multi-Start Generator: added an opportunity to select a material for the first layer (the layer closest to the substrate). It can be selected from (i) the list of loaded materials, (ii) specified as the most contrast with respect to the substrate, and (iii) specified as any available (random selection).

2. Formula editor enhancement: it is now possible to specify the central wavelength for selected groups of layers, different from the reference wavelength of the entire design.

3. Enhancement of the Variator (Analysis on the fly): Ctrl+Alt+C hotkey and "Revert Value" (right click drop-down menu) allows to revert back any single thickness changed in the Variator

4. Enhancement of the Variator (Analysis on the fly): Surroundings Group added to the Variator: it allows to change substrate and incident medium refractive index offsets.

5. Enhancement of the Variator (Analysis on the fly): Control Wavelength added to the Correction Factors Group.

6. Enhancement of the Variator (Analysis on the fly) in the reverse engineering: it is possible to present layer thicknesses in quarter-waves (QW mode).

7. Monte-Carlo simulations enhanced: it is now possible to specify Re(n) standard deviation in %.

8. Import from Essential Macleod improved: imported Design was not saved to the Design database. Fixed.

9. Import from TFCalc improved: Access Violation problem at some files. Fixed.

10. Weight factors of target specified DSG files were wrong imported. Fixed.

11. Inconsistencies in naming and order of Im(n) Exponential models in charcaterization and reverse engineering fixed.

12. Control wavelength changes in the Variator also updates the wavelength at which refractive indices are evaluated for other Variator parts (Substrate, Incidence medium).

13. Monte-Carlo settings of x, y axes are consistent for both pages (Show Statistics = On and Off) and also are correctly saved in the Project configuration.

14. New COM interfaces implemented: added clear, clearAll, copy, rename functions to the databases. Added addPage, setDesign methods to the In-Memory interfaces. Added clear and getRenFormula, getImnFormula methods to the reverse engineering model interface.

15. Improvement in Multi-Start Generator:  prevented user-interface flooding, if the design problem is simple and too many solutions are generated each second.


24.08

1. Adjust Plots on Target/Measurement Load option (Settings ribbon - General options - Plots - Check box "Adjust Plots on Target/Measurement Load").

2. Apply spectra (light source, detector) to R/T values (Settings ribbon - General options - Plots - Check box "Apply source and Detector to R/T values").

3. Added thickness values to the hover panel in the Design Cross-Section panel.

4. Logics of plotting changed: not the theoretical curve is adjusted to local x-limits and replotted on their change with 300ms delay (to avoid too frequent updates).

5. Model report displayed a wrong substrate name and data in some cases. Fixed.

6. When a new target is loaded and the number of plots is therefore changed, "Qty" value (right panel of the evaluation) remains the same. Fixed.

24.07

1. COM Automation interfaces are now available in OTF Studio. C# example is implemented. COM interfaces allows you to use OTF Studio algorithms in your own applications.

2. GD/GDD/Phase Generator Tool added to the Target Editor.

3. Target Generator Tool added to the Target Editor.


24.05

1. Export to OpTaliX improved.

2. Target/Measurement editors improved: when another characteristic is entered, the values of the changed column are preserved instead of using default values.

3. Size of the main panel after restart was a bit different each time. Fixed.

4. A bug on Save Layer in characterization fixed: if offset model was used, the offset was added.


24.03

1. Improved import from RefractiveIndex.Info: for glasses, the most informative part of the title goes now into the  substrate/material name, while the rest goes in the comment.

2. Changing abbreviations in the Environment panel reflects in the selected materials in the Design Builder.

3. Changing abbreviations in General Options dialog had no effect. Bug fixed.

4. One-offset model in characterization was not working properly. Fixed.


24.02

1. Materials group added to General Options panel. It is possible to configure materials representation (colors,  style) in all modes.

2. Icons and material colors, styles added to the Environment panel.


24.01

1. Multi-Coating configuration support allows you to design complex coatings for laser applications: complementary mirror pairs, double-angle for dispersive mirrors. Flexible settings.

2. Added support of processors without AVX2. 

3. Help can be opened with Help command at the Help Ribbon.


23.89

1. Fixed a bug in the measurement configuration dialog.

2. ODX import had a problem when imported into a project with already configured environment, especially of materials were different from the loaded ones. Fixed.

3. Loaded materials in the Environment panel become blank when changing them. Fixed.


23.87

1. Prevented the situation when a design has 2 layers of the same material not combined together.

2. Fixed bug in the Design Report: wrong QWOT values.

3. Improved Gradual Evolution algorithm with settings, where the new layers are inserted.

4. Improved Needle optimization: inserted a layer inside a fixed layer excluded. Fixed. 

5. Added a possibility to exclude layers from the optical monitoring runsheet .

6. Advanced Needle optimization: materials can be active and inactive.


23.86

1. Tooltips feature with markers in the Evaluation plots is implemented. Tooltips show all values presented at the plot with markers.


23.85

1. Line Width was not available in the Environment Panel. Fixed.

2. Reports extended with more detailed information on loaded objects. Added Save as Text comment to the drop-down menus of the Report tabs at the Results ribbon.

3. Added Floating Constants to the computational part and to the Target Editor. Characteristics Selector dialog completely redesigned.

4. In Color Evaluation,  color coordinate system selection was not updated, if preferred color system in Settings ribbon is changed. Fixed.

5. Save object to the database with an existing name (overwrite mode) worked in a wrong way: a different object was overwritten. Fixed.

6. Design Builder has now a footer with a total coating thicknesses. Hint window shows also total  thicknesses for each material.

7. Design Editor now doesn't allow to change the material abbreviation to not-loaded materials if the Design Editor is opened in the In-Memory editor.


23.84

1. On-the-fly analysis (Variator) added to Synthesis ribbon and to the Design Builder. On-the-fly analysis can be applied to spectral characteristics, colors, and electric field.

23.83

1. Copy Numbers option operates also in the electric field panel.

2. Tooltips operate now in electric field panel.

3. Bug in Integral Target optimization fixed.

4. Import of Agilent files showed one less trace than required. Fixed.

5. Monte-Carlo simulations: a bug of target representation fixed.

6. Scale settings inconsistencies in Evaluation and Monte-Carlo plots fixed.

23.82

1. Bug in Optimization with groups fixed.

2. Corrected the format of angles in the legend and in the "Copy Numbers" option to increase the number of digits.

3. Electric field analysis options is developed (View ribbon). It is possible to change all settings using right panel and to adjust the ranges and the types of output. It is also possible to see E-field intensity and E-field phase, s- and p- polarization.

4. Export to Report of large values (GDD, for example) sometimes created overlapped numbers in the output. Fixed.

5. Ability to configure the tabular representation in Report outputs (Model menu at the Results ribbon). It is also possible to specify Measurement wavelength grid as the grid for the dispersion output.


23.79

1. Compare designs feature (View Ribbon) added. Now, it is possible to compare spectral characteristics of the designs from the design table as well as the designs from History and Collection panels.

2. Horizontal scroll bar added to Target/Measurement editors.

3. A computational degradation of performance in cases when some materials were using Spline interpolation fixed.

4. Better visual feedback in the Layer Model Builder: disabled parts of the model are now shown in gray color.

5. Corrected Layer Model Builder problem: when no models are active, in some cases the discrepancy is increased after Fit action.

6. It was possible to select 1 or even 0 materials from multi-start optimization. Fixed. At least 2 materials should be selected for multi-start correct operations.

7. In some cases merit function (MF) was displayed as "n/a" in the main status bar, even if some valid targets were loaded. Fixed.

8. In some cases, after gradual evolution it was not possible to select constraints for some materials, especially when they were excluded/included to Active list. Fixed.

9. Added check for at least 2 materials before gradual evolution starts.

10. If design is edited without layer materials in the memory, it creates Access Violation errors. Fixed.

11. Copy Numbers added to OM plots.

12. MOCCA export adjusted to conform better MOCCA specifications (rate, fixed layers attributes - "non-optical-control").

13. The caption of "New Item Name" form is also updates in accordance of database type selected in this dialog.


23.77

1. Fixed a bug in the Substrate characterization. This bug significantly decreased the efficiency of non-parametric model.

2. In rare cases, Access violation problems were possible, if Monte Carlo computations were running, and the Monte Carlo panel is closed. Fixed.

3. Import of Agilent measurements improved: now it is possible to import traces one by one without closing Import dialog.

4. Added import of designs from Essential Macleod files.


23.76

1. Tooltips feature added to the Evaluation plots.

2. Added SVG and EMF export format to the list of "Save Chart" command (Results ribbon).

3. Copy Numbers feature added: it is available at the right-click drop-down menu of Evaluation and Fitting plots. 

4. Several display bugs in OM mode fixed: non scaled data in the plots were used.

5. Tooltips format (the number of digits) is dependent now on the selected units, argument values are also shown.


23.75

1. Added Color Rendering Index to Color values.

2. Fixed scaling problem in Integral Target part of the merit function.

3. Sensitivity analysis feature added.

4. Problem with positions of secondary dialogs at multimonitor systems fixed.


23.72

1. Optical Monitoring runsheet created.

2. Export to OpTaliX, FRED, and CODE V added.

3. Legend visibility is now save correctly in the project layout.

4. It is possible to select the whole response column data in the Design Runsheet report.

5. Response values are now copied to clipboard without control characters.

6. Color diagram and color values are completed. 

7. Now it is required to save a modified design before switching to OM mode. It removes potential inconsistencies.


23.71

1. In some cases Design Cleaner finished with the same material layers being next to each other. Now such layers are combined together.


23.68

1. ODX file support added: import and export.

2. Import of TFCalc files added.

3. Import and export of DSG files (SPEKTRUM software from LZH).

4. Integral Targets load problem when a spectrum with a special character is used (", &, etc).

5. Reports are now refreshed automatically (with a delay, to save CPU resources).

6. Report becomes empty if it is docked/undocked to another location with mouse. Fixed.

7. OM - Optical Monitoring - Witness Chip config dialog and OM mode added.

8. Specs targets were not displayed correctly: only low limit was shown.

9. Potential infinite loop on any attempt to Terminate a processing in Deep Search mode. Fixed.

10. Better current status updates (Evaluation, Design Cross section) during synthesis processing. It is now performed at least each 5 seconds.

11. Problems with "Fixed" status of layer thickness found and improved.

12. Refractiveindex.info database updated to the newest state of October 2023.

13. Help updated (introduction, examples). The number of Examples is extended up to 43.


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